• A. Serebriakov, Optimization and analysis of Deep-UV imaging systems, ISBN 90-9019672-2 (2005).

• A. Serebriakov, F. Bociort, and J.J.M. Braat, Finding new local minima by switching merit functions in optical system optimization, Optical Engineering, Vol. 44, Issue 10, p. 1005011 - 1005013 (2005).

• A. Serebriakov, E. Maksimov, F. Bociort, and J.J.M. Braat, Birefringence induced by the spatial dispersion in deep UV lithography: theory and advanced compensation strategy, Optical Review, Vol. 12, Issue 2, p. 140-145 (2005).

• F. Bociort, E. van Driel, and A. Serebriakov, Networks of local minima in optical system optimization, Optics Letters, Vol. 29, Issue 2, p. 189-191 (2004).

• A. G. Serebryakov, F. Bociort, and J.J.M. Braat, Spatial dispersion of crystals as a critical problem for deep UV lithography, Journal of Optical Technology, Vol. 70, Issue 8, p. 566-569 (2003).

• V. A. Zverev and A. G. Serebryakov, Basic designs for optical systems with remote pupils, Journal of Optical Technology, Vol. 67, Issue 6, p. 562-565 (2000).

• F. Bornebroek, M. de Wit, W. de Boeij, G. Dicker, JK. Hong, and A. Serebryakov, Cost-effective shrink of semi-critical layers using the TWINSCAN XT:1000H NA 0.93 KrF scanner, Proc. SPIE 7274, 72743I (2009).

• A. Serebryakov, L. Brige, E. Boisseau, E. Peloquin, V. Coutellier, and J. Planchot, Advanced proximity matching with Pattern Matcher, Proc. SPIE 7470, 727013 (2009).

• Y.K. Kim, L. Pohling, N.T. Hwee, J. S. Kim, P. Benyon, J. Depre, JK. Hong, and A. Serebryakov, Proximity matching for ArF and KrF scanners, Proc. SPIE 7272, 72723A (2009).

• A. Serebriakov, C. Chang, A. Becht, R. Pluijms, A. Cheng, E. Shi, H. van den Broek, and Li Zhao, Challenges and solutions for transferring a 248 nm process to 365 nm imaging, Proc. SPIE 5754, Optical Microlithography XX, San Jose, CA, USA, 65204L (2007).

• A. Serebriakov, F. Bociort, and J. Braat, Correction of the phase retardation caused by intrinsic birefringence in deep UV lithography, Proc. SPIE 5754, Optical Microlithography XVIII, San Jose, CA, USA, 1780 (2005).

• F. Bociort, A. Serebriakov, and M. van Turnhout, Saddle points in the merit function landscape of systems of thin lenses in contact, Proc. SPIE 5523, Current Developments in Lens Design and Optical Engineering V, Denver, USA, p. 174-184 (2004).

• A. Serebriakov, F. Bociort, and J. Braat, Advanced compensation strategy for the birefringence induced by spatial dispersion in deep UV lithography, Technical Digest of 2004 ICO International Conference "Optics&Photonics in Technology Frontier", Tokyo, Japan, p. 23-24 (2004).

• A. Serebriakov and F. Bociort, Connected local minima in optical system design, Technical Digest of 2004 ICO International Conference "Optics&Photonics in Technology Frontier", Tokyo, Japan, p. 21-22 (2004).

• A. Serebriakov, F. Bociort, and J.J.M. Braat, Compensation of the birefringence induced by spatial dispersion in 157 nm lithography, Proc. EOS Topical Meeting "Advanced Imaging Techniques", Delft, The Netherlands (2003), ISBN 3 00 012842 5.

• A. Serebriakov, E. Maksimov, F. Bociort, and J.J.M. Braat, The effect of intrinsic birefringence in deep UV-lithography, Proc. SPIE 5249, Optical Design and Engineering, Saint-Etienne, France, p. 624-635 (2004)

• E. van Driel, F. Bociort, and A. Serebriakov, Topography of the merit function landscape in optical system design, Proc. SPIE 5249, Optical Design and Engineering, Saint-Etienne, France, p. 353-363 (2004).

• F. Bociort, E. van Driel, and A. Serebriakov, Network structure of the set of local minima in optical system optimization, Proc. SPIE 5174, Novel Optical Systems Design and Optimization VI, p. 26-34 (2003).

• F. Bociort, A. Serebriakov, and J.J.M. Braat, Local optimization strategies to escape from poor local minima, Proc. SPIE 4832, International Optical Design Conference, Tucson, USA, p. 218-225 (2002).

• A. Serebriakov, Design Problems for lenses with remote pupils, Proc. International Conference «Applied Optics-98», St. Petersburg, Russia (1998).

Conference abstracts

• A. Serebriakov, F. Bociort, and J.J.M. Braat, Birefringence induced by spatial dispersion in modern lithography. New reasons for concern?, 5th ASML Technology Conference, Veldhoven, The Netherlands (2004).

• A. Serebriakov, F. Bociort, and J.J.M. Braat, Compensation of the birefringence induced by the spatial dispersion in lithographic optical design, Digest of 4th International Symposium on 157 nm Lithography, Yokohama, Japan (2003).

• A. Serebriakov, F. Bociort, and J.J.M. Braat, Design of lithographic objectives including the effect of spatially induced birefringence, 4th ASML Technology Conference, Veldhoven, The Netherlands (2003).

• A. Serebriakov, F. Bociort, and J.J.M. Braat, Spatial dispersion in crystals as a showstopper for deep UV lithography, Proc. V International conference Applied Optics, St. Petersburg, Russia, (2002).

• A. Serebryakov, Basic solutions for objectives with stand off pupils, Proc. International conference of young scientists «Optics-99», St. Petersburg, Russia (1999).